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Study of Hard Disk and Slider Surfaces Using X-Ray Photoemission Electron Microscopy and Near Edge X-Ray Absorption Fine Structure Spectroscopy

Published online by Cambridge University Press:  10 February 2011

Simone Anders ,
Thomas Stammler ,
C. Singh Bhatia ,
Joachim Stöhr ,
Walton Fong ,
Chao-Yuan Chen  and
David B. Bogyi
Simone Anders
Affiliation:
Lawrence Berkeley National Laboratory, I Cyclotron Road, Berkeley, CA 94720, [email protected]
Thomas Stammler
Affiliation:
Lawrence Berkeley National Laboratory, I Cyclotron Road, Berkeley, CA 94720, [email protected]
C. Singh Bhatia
Affiliation:
SSD/IBM, 5600 Cottle Road, San Jose, CA 95193
Joachim Stöhr
Affiliation:
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120
Walton Fong
Affiliation:
Computer Mechanics Laboratory, Dept. of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720
Chao-Yuan Chen
Affiliation:
Computer Mechanics Laboratory, Dept. of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720
David B. Bogyi
Affiliation:
Computer Mechanics Laboratory, Dept. of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720
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Abstract

X-ray Photo Emission Electron Microscopy (X-PEEM) and Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy were applied to study the properties of amorphous hard carbon overcoats on disks and sliders, and the properties of the lubricant. The modification of lubricants after performing thermal desorption studies was measured by NEXAFS, and the results are compared to thermal desorption data. The study of lubricant degradation in wear tracks is described. Sliders were investigated before and after wear test, and the modification of the slider coating as well as the transfer of lubricant to the slider was studied. The studies show that the lubricant is altered chemically during the wear. Fluorine is removed and carboxyl groups are formed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 517: Symposium F – Wide Bandgap Semiconductors for High Power, High Frequency , January 1998 , 415
Copyright
Copyright © Materials Research Society 1998

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References

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