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The Study of Boron Implantation in 1:7 Nd/Fe Multilayers

Published online by Cambridge University Press:  21 February 2011

Guoan Cheng  and
Yingguo Peng
Guoan Cheng
Affiliation:
Institute of Applied Physics, Jiangxi University, Nanchang, The people's Republic of China
Yingguo Peng
Affiliation:
Institute of Applied Physics, Jiangxi University, Nanchang, The people's Republic of China
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Abstract

The structures and magnetic characteristics of multilayered samples with alternatively deposited metal layers (Nd and Fe) were studied for 80 keV boron ion implantation to various doses. Boron ion implantation induced amorphization in Nd/Fe multilayers gradually with increasing irradiation dose. The hysteresis loops of magnetization of the samples showed that a sunken curve appear-ed in the second and fourth quadrants of the loops for the depo-sited Nd/Fe films and disappeared when implantation dose was more than 4*1016 B+/cm2. During ion irradiation, the coercive forces of the films were decreased. The saturation magnetization and the residual magnetization decreared first and then increased with increasing ion dose, the squareness ratio S. R increased first and then decreased. Discussion was carried out in this paper.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 147: Symposium C – Ion Beam Processing of Advanced Electronic Materials , 1989 , 357
Copyright
Copyright © Materials Research Society 1989

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References

1. Moorjani, K. and Coey, J.M.D., Magnetic Glasses (Elsevier, new York, 1984).Google Scholar
2. Sellmyer, D.J. and Nafis, S., Phy. Rev. Lett. 57 1173(1986).Google Scholar
3. Connell, G.A.N., J. Magn, Magn. Mater. 54–57,(1986) 1561.Google Scholar
4. Tsutsumi, K. and Sugahara, H., Japan J. App-. Phys. 23 (1984) L169.Google Scholar
5. Chen, H., Thesis, Tsinghua University, 1986.Google Scholar
6. Cadieu, F.J., Cheung, T.D. and wickramasekara, L., J. Magn. Magn. Mater. 54–57 (1986) 535.Google Scholar
7. Liu, B.X. and Ma, E., Physics (Chinese Journal) 15 (1986) 91.Google Scholar
8. Liu, B.X. and Cheng, G.A., Philosophical Magazine-Letters, 55 (1987) 256.Google Scholar
9. Yoshiie, T., Bauer, C.L. and Kryder, M.H., J. Appl. Phys. 57 (1985) 2155.Google Scholar
10. Zhihua, Yan, Baixi, Liu and Hengde, Li, Phys. btat. bol. (a)94 (1986) 483.Google Scholar
11. Chou, Y.L., et al., Proceeding of Fiveth National Conference of Materials and Physics of Amorphous, China, (1988) 264.Google Scholar
12. Guoan, Cheng and Yingguo, Peng, Thin Film Sciences and Technology (Chinese Journal), to be published.Google Scholar