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Studies of Plasma O Atom Concentration by Two-Photon Laser Induced Fluorescence and Optical Emission Spectroscopy

Published online by Cambridge University Press:  21 February 2011

R. Walkup ,
K. Saenger  and
G. S. Selwyn
R. Walkup
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
K. Saenger
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598
G. S. Selwyn
Affiliation:
IBM East Fishkill Development Laboratory, Hopewell Junction, NY 12533
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Abstract

We report quantitative measurements of the concentration of atomic oxygen in RF plasmas determined by two-photon laser induced fluorescence. The results are compared with concurrent measurements of spatially resolved plasma induced optical emission. These measurements establish: (1) the O atom concentration as a function of plasma parameters, (2) a semi-quantitative relationship between O* emission intensity normalized by Ar* in-tensity and O atom concentration, and (3) an understanding of the mechanisms for pro-duction of excited atoms in the plasma.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 69
Copyright
Copyright © Materials Research Society 1985

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