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Structure Determination of the Nisi2(111) Surface Using Medium Energy Ion Scattering with Monolayer Resolution

Published online by Cambridge University Press:  25 February 2011

J. Vrijmoeth ,
P.M. Zagwijn ,
J.W.M. Frenken  and
J.F. van der Veen
J. Vrijmoeth
Affiliation:
F.O.M. - Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands.
P.M. Zagwijn
Affiliation:
F.O.M. - Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands.
J.W.M. Frenken
Affiliation:
F.O.M. - Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands.
J.F. van der Veen
Affiliation:
F.O.M. - Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands.
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Abstract

The surface structure of epitaxial NiSi2 films grown on Si (111) has been determined using a new method. The backscattering signals from subsequent Ni layers in the NiSi2 (111) surface are resolved.

The topology of the NiSi2 (111) surface is concluded to be bulklike, i.e., it is terminated by a Si – Ni – Si triple layer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 202: Symposium C – Evolution of Thin Film and Surface Microstructure , 1990 , 321
Copyright
Copyright © Materials Research Society 1991

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References

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