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Structure And Mechanical Properties Of Reactive Sputter Deposited Tin/Tan Multilayered Films

Published online by Cambridge University Press:  10 February 2011

W.-H. Soe ,
T. Kitagaki ,
H. Ueda ,
N. Shima ,
M. Otsuka  and
R. Yamamoto
W.-H. Soe
Affiliation:
Institute of Industrial Science, University of Tokyo, 7–22–1 Roppongi, Minato-ku, Tokyo 106, Japan, [email protected]
T. Kitagaki
Affiliation:
Shibaura Institute of Technology, 3–9–14 Shibaura, Minato-ku, Tokyo 106, Japan
H. Ueda
Affiliation:
Hitachi Tool Engineering,Ltd., 13–2 Shinizumi, Narita-shi, Chiba 286, Japan
N. Shima
Affiliation:
Hitachi Tool Engineering,Ltd., 13–2 Shinizumi, Narita-shi, Chiba 286, Japan
M. Otsuka
Affiliation:
Shibaura Institute of Technology, 3–9–14 Shibaura, Minato-ku, Tokyo 106, Japan
R. Yamamoto
Affiliation:
Institute of Industrial Science, University of Tokyo, 7–22–1 Roppongi, Minato-ku, Tokyo 106, Japan, [email protected]
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Abstract

TiN/TaN multilayers were grown by reactive magnetron sputtering on WC-Co sintered hard alloy and MgO(100) single crystal substrates. Multilayer structure and composition modulation amplitudes were studied using x-ray diffraction method. Hardness and elastic modulus were mea- sured by nanoindentation tester. For bilayer thickness (Λ) larger than 80 A˚, hardness are lower than rule-of-mixtures value of individual single layers, and increased rapidly with decreasing Λ, peaking at hardness values ≈33% higher than that at A=43 Å. As a result of analysis the inclination of applied load for indenter displacement on P-h curve (ΔP/Δh), this paper exhibits that the en- hancement of the resistance to dislocation motion and elastic anomaly due to coherency strains are responsible for the hardness change.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 505 , 1997 , 463
Copyright
Copyright © Materials Research Society 1998

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References

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