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Structural Characterization of Thin Metal Overlayers by X-ray Photoelectron and Auger-Electron Forward Scattering

Published online by Cambridge University Press:  25 February 2011

W. F. Egelhoff Jr.
W. F. Egelhoff Jr.*
Affiliation:
Surface Science Division, National Bureau of Standards, Gaithersburg, MD 20899
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Abstract

Forward scattering of XPS and Auger electrons by atoms in a crystalline lattice produce beams of enhanced intensity radiating out from the surface at angles corresponding to the internuclear axes present in the top few atomic layers. This effect has been applied to analyze the mechanism of surface segregation in ultrathin metal films, to analyze the interdiffusion at the interfaces of ultrathin films, and to assess the effects of substrate contamination on the growth of epitaxial films. The systems studied in this work are Cu, Ni, and Co on Ni(100), however the purpose of this work is not to investigate these particular systems but to use them to illustrate the capabilities of forward scattering.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 83: Symposium J – Physical and Chemical Properties of Thin Metal Overlayers and Alloy Surfaces , 1986 , 189
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

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