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Structural and Interfacial Characteristics of thin (<10 nm) SiO2 Films Grown by Electron Cyclotron Resonance Plasma Oxidation on [100] Si Substrates

Published online by Cambridge University Press:  16 February 2011

Tai D. Nguyen ,
D. A. Carl ,
D. W. Hess ,
M. A. Lieberman  and
R. Gronsky
Tai D. Nguyen
Affiliation:
Center for X-Ray Optics, Accelerator and Fusion Research DivisionLBL National Center for Electron Microscopy, Materials Sciences Division, LBL, and Department of Materials Sience and Mineral Engineering
D. A. Carl
Affiliation:
Department of Chemical Engineering
D. W. Hess
Affiliation:
Department of Chemical Engineering
M. A. Lieberman
Affiliation:
Department of Electrical Engineering and Computer Science, University of California, Berkeley, California 94720, U.S.A.
R. Gronsky
Affiliation:
National Center for Electron Microscopy, Materials Sciences Division, LBL, and Department of Materials Sience and Mineral Engineering Department of Chemical Engineering
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Abstract

The feasibility of fabricating ultra-thin SiO2 films on the order of a few nanometer thickness has been demonstrated. SiO2 thin films of approximately 7 nm thickness have been produced by ion flux-controlled Electron Cyclotron Resonance plasma oxidation at low temperature on [100] Si substrates, in reproducible fashion. Electrical measurements of these films indicate that they have characteristics comparable to those of thermally grown oxides. The thickness of the films was determined by ellipsometry, and further confirmed by crosssectional High-Resolution Transmission Electron Microscopy. Comparison between the ECR and the thermal oxide films shows that the ECR films are uniform and continuous over at least a few microns in lateral direction, similar to the thermal oxide films grown at comparable thickness. In addition, HRTEM images reveal a thin (1–1.5 nm) crystalline interfacial layer between the ECR film and the [100] substrate. Thinner oxide films of approximately 5 nm thickness have also been attemped, but so far have resulted in nonuniform coverage. Reproducibility at this thickness is difficult to achieve.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 75
Copyright
Copyright © Materials Research Society 1991

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References

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