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Stressed States and Self-Organized Structuring of W/C Multilayers

Published online by Cambridge University Press:  21 March 2011

D.C. Meyer ,
A. Klingner ,
T. Leisegang ,
Th. Holz ,
R. Dietsch  and
P. Paufler
D.C. Meyer
Affiliation:
Fraunhofer Institute for Material and Beam Technology, Winterbergstrasse 28, D-01277 Dresden, Germany
A. Klingner
Affiliation:
Fraunhofer Institute for Material and Beam Technology, Winterbergstrasse 28, D-01277 Dresden, Germany
T. Leisegang
Affiliation:
Fraunhofer Institute for Material and Beam Technology, Winterbergstrasse 28, D-01277 Dresden, Germany
Th. Holz
Affiliation:
Institute of Crystallography and Solid State Physics, Dresden University of Technology, Mommsenstrasse 13, D-01069 Dresden, Germany
R. Dietsch
Affiliation:
Institute of Crystallography and Solid State Physics, Dresden University of Technology, Mommsenstrasse 13, D-01069 Dresden, Germany
P. Paufler
Affiliation:
Institute of Crystallography and Solid State Physics, Dresden University of Technology, Mommsenstrasse 13, D-01069 Dresden, Germany
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Abstract

Characterization and quantitative analysis of stressed states of a series of W/C multilayers (10-40 periods prepared by pulsed laser deposition on Si (111) substrates of different thickness) were carried out by means of X-ray reflectometry, wide angle diffractometry and a novel laser mapping device. As the W/C multilayers were dedicated to technical applications as X-ray optics and subjected to optimization of stacking parameters (thickness and number of layers) for a long term (mechanical) stability also further investigations will be discussed. Comparison of wafer distortion as evaluated by laser scanning and strain of the W layer as deduced from X-ray diffraction let us conclude that W layers are under compressive and C layers under tensile stress. The investigation of the thermally stimulated relaxation behavior of the multilayers provided a confirmation of these results. Additional information could be obtained by comparative relaxation experiments under external mechanical constraints. Furthermore, we report on a self-organized process of structuring of the multilayers under investigation, which might be of interest also from a technical point of view. The entire surface area (diameter 2') could be converted from the smooth (as-deposited) to a structured (relaxed) state stable at room temperature. Investigations using optical and atomic force microscopy showed that the topology of the surface consists of a mountain range where the valleys are on the level of the as-deposited non-debonded surface and that long wrinkled ridges of about the same height run along arbitrary directions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 695: Symposium L – Thin Films: Stresses and Mechanical Properties IX , 2001 , L12.2.1
Copyright
Copyright © Materials Research Society 2002

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References

REFERENCES

1. Dietsch, R., Holz, Th., Mai, H., Panzner, M., Völlmar, S., J. Optical and Quantum Electronics 27, 1385–1396 (1995).Google Scholar
2. Meyer, D.C., Klingner, A., Holz, Th., Paufler, P., Appl.Phys. A 69 (6), 657–659 (1999).Google Scholar
3. Weihnacht, V., Brückner, W., in Stress Induced Phenomena in Metallization: Fifth International Workshop, edited by Kraft, O. et al., American Institute of Physics, 283–288 (1999).Google Scholar
4. Brückner, W., Baunack, S., Thin solid films 355–356, 316–321 (1999).Google Scholar
5. Stoney, G.G., Proc. R. Soc. London, Ser. A 82, 172–175 (1909).Google Scholar
6. Klingner, A., Internal Stresses in W/C Nanometer Multilayers, Diploma Thesis, TU Dresden (2000)Google Scholar