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Stranski-Krastanov Growth of Ni on Si(111) at Room Temperature
Published online by Cambridge University Press: 25 February 2011
Abstract
We introduce quantitative Auger lineshape analysis methods to study the room temperature reaction of nickel on Si(111). We show that coexisting phases may be separated by numerically fitting the composite lineshapes using a linear combination of single phase “fingerprint” spectra, obtained by scraping bulk compounds in situ. The reaction proceeds in three stages. For nickel coverage below 1 Å, the growth is layerwise, forming NiSi2. For nickel coverage from 3 to 12 Å, islands of Ni2Si are formed. For nickel coverage above 12 Å, islands of pure nickel are formed. The overlayer reactions appear to be a kinetically limited form of Stranski-Krastanov growth, with multiple compound formation.
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- Copyright © Materials Research Society 1990
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