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Stm Study of the Influence of Adsorption on Step Dynamics

Published online by Cambridge University Press:  10 February 2011

T. P. Moffat
T. P. Moffat*
Affiliation:
Materials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, Md 20899
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Abstract

In situ STM has been used to examine the influence of anion adsorption and metal underpotential deposition on the structure and dynamics of steps on copper surfaces. Chloride is shown to form potential dependent adlayer structures on Cu(100) and Cu(111) which strongly affects the orientation of the surface steps. The adlayer acts as a template guiding step evolution during metal deposition and dissolution. Metal underpotential deposition (upd) exhibits similar effects on step structure. This is demonstrated for Pb upd on Cu(lll). In this instance the Pb monolayer displaces chloride from the surface and leads to a reorientation of the steps and an alteration of the step dynamics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 451: Symposium P – Electrochemical Synthesis and Modification , 1996 , 75
Copyright
Copyright © Materials Research Society 1997

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References

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