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Stability of Nitrogen in Sputtered Iron Nitride thin films and Multilayers

Published online by Cambridge University Press:  15 February 2011

H. Chatbi
Affiliation:
Laboratoire de Métallurgie Physique et Science des Matériaux, (U. R. A. au C. N. R. S. n° 155)Université Henri Poincaré Nancy 1, B. p. 239, 54506 Vandoeuvre-lès-Nancy Cedex, France
M. Vergnat
Affiliation:
Laboratoire de Métallurgie Physique et Science des Matériaux, (U. R. A. au C. N. R. S. n° 155)Université Henri Poincaré Nancy 1, B. p. 239, 54506 Vandoeuvre-lès-Nancy Cedex, France
J. F. Bobo
Affiliation:
Laboratoire de Métallurgie Physique et Science des Matériaux, (U. R. A. au C. N. R. S. n° 155)Université Henri Poincaré Nancy 1, B. p. 239, 54506 Vandoeuvre-lès-Nancy Cedex, France Department of Materials Science and Engineering, Stanford University, Stanford, CA, 94305–2205, [email protected]
L. Hennet
Affiliation:
Laboratoire de Métallurgie Physique et Science des Matériaux, (U. R. A. au C. N. R. S. n° 155)Université Henri Poincaré Nancy 1, B. p. 239, 54506 Vandoeuvre-lès-Nancy Cedex, France
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Abstract

Different phases of FeN thin films and Fe/FeN multilayers were prepared by reactive rf sputtering. The release of nitrogen and the crystallographic transformations during annealing were monitored by thermal desorption spectrometry and X-ray diffraction experiments. Finally, the diffusivity of nitrogen in the γ-Fe4N phase was evaluated.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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References

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