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Sputtering of Au Induced by Single Xe Ion Impacts

Published online by Cambridge University Press:  10 February 2011

R. C. Birtcher  and
S. E. Donnelly
R. C. Birtcher
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL, USA
S. E. Donnelly
Affiliation:
Joule Physics Laboratory Research Institute, University of Salford, Salford, United Kingdom
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Abstract

Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanopanicles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 585: Symposium L – Fundamental Mechanisms of Low-Energy-Beam Modified Surface , 1999 , 117
Copyright
Copyright © Materials Research Society 2000

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