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Spectroscopic and Structural Studies of Some Precursors for the Deposition of PZT and Related Materials by MOCVD

Published online by Cambridge University Press:  10 February 2011

Kirsty A. Fleeting
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK.
Tony C. Jones
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK.
Tim Leedham
Affiliation:
Inorgtech Ltd, 25 James Carter Rd, Mildenhall, Suffolk, IP28 7DE, UK.
M. Azad Malik
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK.
Paul O'brien
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK.
David J. Otway
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK.
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Abstract

MOCVD is a useful method for the deposition of thin films of lead zirconium titanate, PZT, because of its good step coverage and control of composition. Results are herein presented on a number of novel compounds which are potential MOCVD precursors. The compounds studied include Pb(tmhd)2, Zr(OBu')4 and Ti(OPr')4. Another commonly utilized precursor Zr(tmhd)4, is not ideal, in that it is a high melting point solid, and hence requires high substrate temperatures. We have sought to modify Zr precursors through chemical methods and have synthesized a number of novel, more volatile, and less intrinsically thermally stable MOCVD precursors. Full chemical characterization of the Zr precursors (NMR, IR, MS, CHN, TGA/DSC, Single Crystal X-ray diffraction) has been undertaken. We also present structural results on some related lead precursors.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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