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Some Recent Results of Fundamental Studies on Beam-Induced Surface Processes

Published online by Cambridge University Press:  25 February 2011

Jan Dieleman
Jan Dieleman*
Affiliation:
Philips Research Laboratories 5600 JA Eindhoven, The Netherlands
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Extract

Recent results of studies on the mechanism of processes induced by the interaction of beams of (reactive) particles with surfaces in UHV, often combined with concurrent bombardment of the surface with low-energy ion or excimer laser beams, are reviewed. Angular-resolved mass spectrometry combined with time-of-flight studies on the desorbing products is used as a key diagnostic. A more complete picture is obtained using several other diagnostic tools to characterize the surface before, during or after the interaction. Interactions at Si and Cu surfaces will be emphasized. The review will deal successively with data for interaction with a single beam of Cl2, low-energy noble gas ions or excimer laser pulses, followed by data on the concurrent interaction of crossed beams of Cl2 and low-energy noble gas ions or excimer laser pulses with these surfaces. Some conclusions will be drawn.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 3
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

1. Winters, H.F., Coburn, J.W. and Chuang, T.J., J. Vac. Sci. Technol. B1, 469 (1983)10.1116/1.582629Google Scholar
2. Winters, H.F., J. Vac. Sci. Technol. A 6, 1997 (1988)Google Scholar
3. Mayer, T.M., Ameen, M.S. and Vitkavage, D.J., in The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis Vol.5: Surface Properties of Electronic Materials, edited by King, D.A. and Woodruff, D.P. (Elsevier Science Publishers, New York, 1988), p. 427 Google Scholar
4. Oostra, D.J. and de Vries, A.E., Nucl. Instr. and Meth. B18, 618 (1987)Google Scholar
5. Zalm, P.C., Vacuum 36, 787 (1986); Surf. Interf. Anal. 11, 1 (1988)Google Scholar
6. Kolfschoten, A.W., Nucl. Instr. and Meth. B19/20, 1001 (1987)Google Scholar
7. Dieleman, J., in Photon, Beam and Plasma Enhanced Processes, edited by Golanski, A., Nguyen, V.T. and Krimmel, E.F. (European Mat. Res. Soc. Proc. XV, les éditions de physiques, Les Ulis, France), p. 363 (1988):Google Scholar
8. Florio, J.V. and Robertson, W.D., Surf. Sci. 18, 398 (1969)10.1016/0039-6028(69)90182-4Google Scholar
9. Madix, R.J. and Schwarz, J.A., Surf. Sci. 24, 264 (1971)CrossRefGoogle Scholar
10. Sanders, F.H.M., Kolfschoten, A.W., Dieleman, J., Haring, R.A., Haring, A. and de Vries, A.E., J. Vac. Sci. Technol. A2, 481 (1984)Google Scholar
11. Seel, M. and Bagus, P.S., Phys. Rev. B 28, 2023 (1983)Google Scholar
12. Winters, H.F., J. Vac. Sci. Technol. A3, 786 (1985)10.1116/1.573309Google Scholar
13. Park, S., Rhodin, T.N. and Rathbun, L.C., J. Vac. Sci. Technol. A4, 168 (1986)10.1116/1.573465Google Scholar
14. Sesselman, W. and Chuang, T.J., Surf. Sci. 176, 32 (1986); 176, 67 (1986)10.1016/0039-6028(86)90163-9CrossRefGoogle Scholar
15. Szymonski, M., Appl. Phys. 23, 89 (1980)10.1007/BF00899575Google Scholar
16. Dieleman, J., Le Vide-Les Couches Minces, Suppl. to Vol.218, 3 (1983)Google Scholar
17. Dembovski, J., Oechsner, H., Yamamura, Y. and Urbassek, M., Nucl. Instr. and Meth. 818, 464 (1987)Google Scholar
18. Brizzolara, R.A., Cooper, C.B. and Olson, T.K., Nucl. Instr. and Meth. B35, 36 (1988)10.1016/0168-583X(88)90095-XCrossRefGoogle Scholar
19. van Veen, G.N.A., Sanders, F.H.M., Dieleman, J., van Veen, A., Oostra, D.J. and de Vries, A.E., Phys. Rev. Lett. 57, 739 (1986)Google Scholar
20. van Zwol, J., de Zwart, S.T., and Dieleman, J., to be publishedGoogle Scholar
21. Kelly, R. and Dreyfus, R.W., Surf. Sci. 198, 263 (1988)Google Scholar
22. Hayes, T.R., Wetzel, R.C., Baiocchi, F.A. and Freund, R.S., J. Chem. Phys. 88, 823 (1988); T.R. Hayes, R.J. Thul, F.A. Baiocchi, R.C. Wetzel and R.S. Freund, J. Chem. Phys. 89, 4035 (1988); R.J. Shul, T.R. Hayes, R.C. Wetzel, F.A. Baiocchi and R.S. Freund, J. Chem. Phys. 89, 4042 (1988)Google Scholar
23. Kolfschoten, A.W., Haring, R.A., Haring, A. and de Vries, A.E., J. Appl. Phys. 55, 3813 (1984)Google Scholar
24. Oostra, D.J.. Haring, A., van Ingen, R.P. and de Vries, A.E., J. Appl. Phys. 64, 315 (1988)Google Scholar
25. Sanders, F.H.M., Kolfschoten, A.W., Dieleman, J., Haring, R.A., Haring, A. and de Vries, A.E., J. Vac. Sci. Technol. A2, 487 (1984)10.1116/1.572601Google Scholar
26. Dieleman, J., Sanders, F.H.M., Kolfschoten, A.W., Zalm, P.C., de Vries, A.E. and Haring, A., J. Vac. Sci. Technol. B3, 1384 (1985)Google Scholar
27. van Zwol, J., van Laar, J., Kolfschoten, A.W. and Dieleman, J., J. Vac. Sci. Technol. B 5, 1410 (1987)Google Scholar
28. Mizutani, T., Dale, C.A., Chu, W.K. and Mayer, T.M., Nucl. Instr. And Meth. B7/8, 825 (1985)CrossRefGoogle Scholar
29. Barish, E.L., Vitkavage, D.J. and Mayer, T.M., J. Appl. Phys. 57, 1336 (1985)CrossRefGoogle Scholar
30. Zalm, P.C., Kolfschoten, A.W., Sanders, F.H.M. and Vischer, P., Nucl. Instr. and Meth. B 18, 625 (1987).CrossRefGoogle Scholar
31. Haring, R.A., Roosendaal, H.E. and Zalm, P.C., Nucl. Instr. and Meth. B28, 205 (1987)10.1016/0168-583X(87)90106-6Google Scholar
32. Horiike, Y., Hayasaka, N., Sekine, M., Arikado, T., Nakase, M. and Okano, H., Appl. Phys. A 44, 313 (1987)Google Scholar
33. Kullmer, R. and Bäuerle, D., Appl. Phys. A 43, 227 (1987); P. Mogyorosi, K. Piglmayer, R. Kullmer and D. BAuerle, Appl. Phys. A 45, 293 (1988)Google Scholar
34. Ritsko, J.J., Ho, F. and Hurst, J., Appl. Phys. Lett. 51, 78 (1988)Google Scholar
35. Baller, T., Oostra, O.J., de Vries, A.E. and van Veen, G.N.A., J. Appl. Phys. 60, 2321 (1986)Google Scholar
36. de Jonge, R., Majoor, J., Benoist, K. and de Vries, D., Europhys. Lett. 2, 843 (1986)Google Scholar
37. Baller, T., van Veen, G.N.A. and Dieleman, J., in Photon, Beam and Plasma Enhanced Processes, edited by Golanski, A., Nguyen, V.T. and Krimmel, E.F. (European Mat. Res. Soc. Proc. XV, les éditions de physique, Les Ulis, France), p. 415 (1988)Google Scholar
38. Baller, T.S., van Zwol, J., de Zwart, S.T., Feil, H. and Dieleman, J., paper B3.3 this symposiumGoogle Scholar
39. Sesselman, W., Marinero, E.E. and Chuang, T.J., Appl. Phys. A41, 209 (1986)10.1007/BF00616842Google Scholar
40. Chen, L., Liberman, V., O'Neill, J.A. and Osgood, R.M., in Laser and Particle-Beam Chemical Processing for Microelectronics, edited by Ehrlich, D.J., Higashi, G.S. and Oprysko, M.M. (Mat. Res. Soc. Proc. 101, Pittsburgh, PA 1988) p. 463 Google Scholar
41. Baller, T.S., van Veen, G.N.A. and Dieleman, J., J. Vac. Sci. Technol. A6, 1409 (1988)10.1116/1.575715Google Scholar
42. van Veen, G.N.A., Baller, T.S. and Dieleman, J., Appl. Phys. A47, 183 (1988)Google Scholar