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Solid-Phase Amorphization in Layered Metal/Silicon thin Films

Published online by Cambridge University Press:  25 February 2011

Menachem Nathan*
Affiliation:
Martin Marietta Laboratories, 1450 S. Rolling Rd., Baltimore, MD 21227
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Abstract

A general scheme for determining which metal-Si systems undergo solidphase amorphization (SPA) upon rapid thermal annealing is presented and used to investigate Ni-Si, Ti-Si, V-Si, Co-Si and Cr-Si reactions. SPA occurs only in the first three systems. With the glaring exception of Co-Si, the results agree with the thermodynamic predictions of SPA in systems in which the free energy of a glassy phase is significantly lower than the free energy of the separate components. The amorphization may also be influenced by the diffusing species and contamination. Following SPA, the first crystalline compound is determined by nucleation kinetics.

Type
Research Article
Copyright
Copyright © Materials Research Society 1988

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References

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