Hostname: page-component-586b7cd67f-t8hqh Total loading time: 0 Render date: 2024-11-29T07:25:14.742Z Has data issue: false hasContentIssue false

Slow Degradation of Hydrogenated Amorphous Silicon Photoconductivity Under Pulsed Illumination

Published online by Cambridge University Press:  15 February 2011

Stephan Heck
Affiliation:
National Renewable Energy Laboratory, Golden, CO, 80401
Howard M. Branz
Affiliation:
National Renewable Energy Laboratory, Golden, CO, 80401
Get access

Abstract

We degraded hydrogenated amorphous silicon (a-Si:H) using red light pulses of 32 microseconds to 2 milliseconds. These metastable photoconductivity degradations were compared to degradation with continuous light of the same intensity and same exposure time. For a given integrated exposure time we observe higher degraded photoconductivities (by up to 40 %) as we shorten the pulses. For example, to obtain the same amount of degradation with 120 microsecond pulses as with continuous illumination, the integrated sample exposure time must be doubled. Experiments were conducted to exclude thermal effects. Our result cannot be explained with a simple recombination-driven degradation mechanism, because electron and hole populations rise and fall to steady-state values in only a few microseconds. We conclude that carrier recombination creates a more proximate precursor to metastable degradation of a-Si:H. When illumination begins, this precursor's density rises more slowly than the density of photocarriers and therefore degradation is delayed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Staebler, D. L. and Wronski, C. R., Appl. Phys. Lett. 31, 292 (1977).Google Scholar
2. Fritzsche, H., in Proceedings of the Amorphous and Microcrystalline Silicon Technology-1997, edited by Schiff, E. A., Hack, M., Wagner, S., Schropp, R., and Shimizu, I. (Materials Research Society, Pittsburgh, San Francisco, 1997), p. 19.Google Scholar
3. Stutzmann, M., in Proceedings of the Amorphous and Microcrystalline Silicon Technology-1997, edited by Schiff, E. A., Hack, M., Wagner, S., Schropp, R., and Shimizu, I. (Materials Research Society, Pittsburgh, San Francisco, 1997), p. 37.Google Scholar
4. Hoheisel, M. and Fuhs, W., Phil. Mag. B 57, 411 (1988).Google Scholar
5. Heck, S. and Branz, H. M., to be published.Google Scholar
6. Branz, H. M., Phys. Rev. B 59, 5498 (1999).Google Scholar