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Simultaneous Spatially Resolved Multispectral Optical Emission Of Sputter Processes

Published online by Cambridge University Press:  15 February 2011

J. D. Klein  and
S. L. Clauso
J. D. Klein
Affiliation:
EIC Laboratories, Inc., Norwood, MA 02062, [email protected]
S. L. Clauso
Affiliation:
EIC Laboratories, Inc., Norwood, MA 02062, [email protected]
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Abstract

An optical spectroscopy system was configured to monitor several plasma positions at the same time. The system allows monitoring of several points within a single plasma. Magnetron sputtering of YBa2Cu3O7 (YBCO) in a reduction-oxidation (redox) environment provided a process in which both cation and gas species are vital in determining the quality of the product film. Spatial sampling of the sputter plasma defined a disparity in the manner in which Ba and Cu emissions respond to changes in chamber gas composition. Oxygen emissions were found to respond quickly to inlet gas composition while Cu emissions were notably sluggish.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 406: Symposium L – Diagnostic Techniques for Semiconductor Materials Processing , 1995 , 81
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

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