Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-23T13:33:12.613Z Has data issue: false hasContentIssue false
  • English
  • Français

A simulation study for defects in sub-15 nm line-space using directed self-assembly

Published online by Cambridge University Press:  21 April 2015

Hideki Kanai ,
Katsuyoshi Kodera ,
Yuriko Seino ,
Hironobu Sato ,
Yusuke Kasahara ,
Katsutoshi Kobayashi ,
Ken Miyagi ,
Shinya Minegishi ,
Naoko Kihara  and
Yoshiaki Kawamonzen
...Show all authors
Hideki Kanai
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Katsuyoshi Kodera
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Yuriko Seino
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Hironobu Sato
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Yusuke Kasahara
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Katsutoshi Kobayashi
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Ken Miyagi
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Shinya Minegishi
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Naoko Kihara
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Yoshiaki Kawamonzen
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Tomoharu Fujiwara
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Noriyuki Hirayanagi
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Toshikatsu Tobana
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Tsukasa Azuma
Affiliation:
EUVL Infrastructure Development Center, Inc. (EIDEC), 16-1 Onogawa, Tsukuba, Ibaraki, 305-8569, Japan
Get access

Abstract

A specific type of buried defect in lamellar phase diblock copolymer was studied by experiments and simulations using self-consistent field theory (SCFT). The defects had 3-dimensional structures and created hexagonally arranged holes. They existed not only on the substrate with the guide structures but in fingerprints. The simulation results suggested that one of the causes of the defects is mismatch of the surface affinity of the neutral layer.

Keywords

morphologypolymersimulation
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1750: Symposium KK – Directed Self-Assembly for Nanopatterning , 2015 , mrsf14-1750-kk05-18
Copyright
Copyright © Materials Research Society 2015 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Müller, Marcus, Daoulasa, Kostas Ch., Norizoe, Yuki, Phys. Chem. Chem. Phys., 11, 2087 (2009).CrossRefGoogle Scholar
Liu, Chi-Chun, Ramírez-Hernández, Abelardo, Han, Eungnak, Craig, Gordon S. W., Tada, Yasuhiko, Yoshida, Hiroshi, Kang, Huiman, Ji, Shengxiang, Gopalan, Padma, de Pablo, Juan J., Nealey, Paul F., Macromolecules, 46(4), 1415 (2013).CrossRefGoogle Scholar
Farrell, Richard A., Hosler, Erik R., Schmid, Gerard M., Xu, Ji, Preil, Moshe E., Rastogi, Vinayak, Mohanty, Nihar, Kumar, Kaushik, Cicoria, Michael J., Hetzer, David R., DeVilliers, Anton, Proc. SPIE, 9051, 90510Z (2014).Google Scholar
Jeong Park, Moon, Balsara, Nitash P., Macromolecules, 41, 3678 (2008).CrossRefGoogle Scholar
Matsen, M. W., Thompson, R. B., Chem, J.. Phys., 111(15), 7139 (1999).Google Scholar
Petrus, Pavel, Lísal, Martin, Brennan, John K., Langmuir, 26(18), 14680 (2010).CrossRefGoogle Scholar
Seino, Yuriko et al. ., The 40th International Conference on Micro and Nano Engineering (MNE 2014), 8076 (2014); 27th International Microprocesses and Nanotechnology Conference (MNC 2014), 7A-9-1(2014).Google Scholar
Kodera, Katsuyoshi et al. ., Journal of Photopolymer Science and Technology, 27(1), 31 (2014); Proc. SPIE 9049 904926 (2014).Google Scholar