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Simox Material Development for Sub-0.25µm Cmos Technology

Published online by Cambridge University Press:  22 February 2011

D.K. Sadana ,
H.J. Hovel ,
J.L. Frecouf ,
S.F. Chu  and
T.J. Watson
D.K. Sadana
Affiliation:
IBM SRDC
H.J. Hovel
Affiliation:
IBM SRDC
J.L. Frecouf
Affiliation:
IBM SRDC
S.F. Chu
Affiliation:
IBM SRDC
T.J. Watson
Affiliation:
Research Center Yorktown Heights, NY 10598
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Abstract

Advantages of SOI materials for CMOS technology arc discussed. The lending SOI materials for CMOS applications appear to be SIMOX and BSOl presently. Progress made in two types of SIMOX, namely, standard and thin BOX. is presented. Recent results from 200mm SIMOX are included. Finally, various defects in annealed SIMOX are discussed. An effort has been made to present data which is typical of commercial SIMOX.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 699
Copyright
Copyright © Materials Research Society 1994

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References

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