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Silicides and Rapid Thermal Annealing

Published online by Cambridge University Press:  26 February 2011

F. M. d'Heurle ,
R. T. Hodgson  and
C. Y. Ting
F. M. d'Heurle
Affiliation:
IBM Research Center, P. O. Box 218, Yorktown Heights, NY 10598
R. T. Hodgson
Affiliation:
IBM Research Center, P. O. Box 218, Yorktown Heights, NY 10598
C. Y. Ting
Affiliation:
IBM Research Center, P. O. Box 218, Yorktown Heights, NY 10598
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Abstract

In the first part of this paper the role of rapid thermal annealing in sulicide processing is viewed from a theoretical point of view with respect to what is known about metal-silicon reactions. The second part is a brief survey of the quickly expanding literature on the rapid thermal annealing of silicides. Whereas RTA does not appear to solve all, or perhaps even any, of the problems encountered in the use of silicides, it is concluded that RTA presents a number of definite advantages.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 52: Symposium B – Rapid Thermal Processing , 1985 , 261
Copyright
Copyright © Materials Research Society 1986

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