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Sharp Silicon Nano-Needles Based on Boron Etch-Stop in TMAH Solutions

Published online by Cambridge University Press:  28 January 2011

Sheping Yan ,
Yang Xu ,
Junyi Yang ,
Huiquan Wang ,
Zhonghe Jin  and
Yuelin Wang
Sheping Yan
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Yang Xu
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Junyi Yang
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Huiquan Wang
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Zhonghe Jin
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Yuelin Wang
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
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Abstract

Operations on biological living cells and molecular devices have driven research towards implementation of high-aspect-ratio nano-needles. However, current nano-needle fabrication is complicated to control the sizes and angles. In this work, we develop a simple method to fabricate repeatable and integrated circuit (IC)-compatible sharp silicon nano-needles based on boron etch-stop in tetramethyl ammonium hydroxide (TMAH) solutions, and the needle angles can be accurately controlled. An analytical model is proposed to efficiently predict the needle sizes and explain the etching evolution of silicon nano-needles.

Keywords

nanostructuremicroelectro-mechanical (MEMS)Si
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1301: Symposium V/NN/OO/PP – Soft Matter, Biological Materials and Biomedical Materials—Synthesis, Characterization and Applications , 2011 , mrsf10-1301-pp03-20
Copyright
Copyright © Materials Research Society 2011

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References

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