Fluorine-doped tin oxide films were produced by atmospheric pressure chemical vapor deposition (APCVD) from the reaction of tin tetrachloride, water, and difluoroethanc. Tin oxide films deposited on glass substrates containing high sodium concentrations tended to be of lower quality with higher resistivities than films deposited on low sodium glass. Scanning electron Microscopy (SEM) was used to study the differences in film nucleation on the high and low sodium containing glass substrates. Eiarly in the nuclcation process, individual grains of tin oxide crystals arc observed to be distributed discontinuously over the substrates. As the deposition time was increased the number of nucleation sites increased and the individual grains became larger. The number of nucleation sites was consistently higher on the high sodium glass. However, numerous inclusions of sodium chloride crystals were observed by EDX in the tin oxide films deposited on the high sodium glass. SEM cross sections revealed how the film growth converted from the grains, which initially nucleated on the glass surface, to columns in the direction perpendicular to the substrate surface. Results for tin oxide grown on sodium-containing glass over coated with silica are also be presented.