Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-11-29T08:22:11.310Z Has data issue: false hasContentIssue false

Scanning Electron-Beam Dielectric Microscopy for the Temperature Coefficient Distribution of Dielectric Materials

Published online by Cambridge University Press:  17 March 2011

Yasuo Cho*
Affiliation:
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira Aoba-ku Sendai 980-8577, Japan
Get access

Abstract

Studies on scanning electron-beam dielectric microscopy (SEDM) are reported. This microscopy technique is used for determining the temperature coefficient distribution of dielectric materials using an electron-beam as a heat source instead of a light beam as in photothermal dielectric microscopy. This microscopy technique, which has the ability to simultaneously observe SEM images and the material composition by EPMA, has a resolution better than that of photothermal dielectric microscopy. To demonstrate the usefulness of this technique, the two-dimensional image of a two-phase composite ceramic composed of TiO2 and Bi2Ti4O11 is measured. To shorten a measurement time, a new type of SEDM for measuring the real time transient response caused by a single pulsed electron-beam is also successfully developed. Finally, a quantitative measurement method of temperature coefficient is also developed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Cho, Y., Kasahara, T. and Fukuda, K., J. Am. Ceram. Soc., 82, 1720 (1999).Google Scholar
2. Cho, Y. and Kumamaru, T., Rev. Sci. Instrum., 67, 19 (1996).Google Scholar
3. Cho, Y. and Kumamaru, T., Jpn. J. Appl. Phys., 35, 2907 (1996).Google Scholar
4. Cho, Y. and Kumamaru, T., Jpn. J. Appl. Phys., 36, 3303, (1997).Google Scholar
5. Nishigaki, S., Kato, H., Yano, S. and Kamimura, R., Am.Ceram. Soc. Bull., 66, 1405 (1987).Google Scholar
6. Fukuda, K., Kitoh, R. and Awai, A., Jpn. J. Appl. Phys., 32, 4584 (1993).Google Scholar
7. Rosencwaig, A. and Gersho, A.., J. Appl. Phys., 47, 64 (1976).Google Scholar
8. Cho, Y., Kazuta, S., Ohara, K. and Odagawa, H., Jpn. J. Appl. Phys., 39, 3086 (2000).Google Scholar
9. Cho, Y., Ohara, K., Kazuta, S. and Odagawa, H., Integrated Ferroelectrics, 32, 133 (2001).Google Scholar
10.Cho, Y., Ohara, K., Kazuta, S. and Odagawa, H., Journal of the European Ceramic Society, 21, 2135 (2001).Google Scholar