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Role of Surface Steps in Thin Film Growth and Properties Studied by Leem

Published online by Cambridge University Press:  21 February 2011

M. S. Altman ,
Q. Cai ,
W. F. Chung ,
E. Z. Luo ,
H. Pinkvos  and
E. Bauer
M. S. Altman
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
Q. Cai
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
W. F. Chung
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
E. Z. Luo
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
H. Pinkvos
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
E. Bauer
Affiliation:
Physikalisches Institut, Technische Universität Clausthal, Leibnizstrasse 4, D-38678 Clausthal- Zellerfeld, Germany
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Abstract

Atomic steps are a common defect at surfaces. Observations made with low energy electron microscopy are presented which demonstrate the impact of steps in growth, phase transitions, magnetic and orientational properties of thin films and clusters at surfaces. Most of these observations can be explained if steps modify the overlayer strain or interface energy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 355: Symposium B1 – Evolution of Thin-Film and Surface Structure and Morphology , 1994 , 235
Copyright
Copyright © Materials Research Society 1995

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