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The Role of Ion Beam Assisted Surface Chemistry in Etching: Adsorption and Reactions of ALKYL Halides

Published online by Cambridge University Press:  25 February 2011

Duncan Marshall  and
Richard B. Jackman
Duncan Marshall
Affiliation:
University College London, Electronic and Electrical Engineering, Torrington Place, London, WC1E 7JE, UK
Richard B. Jackman
Affiliation:
University College London, Electronic and Electrical Engineering, Torrington Place, London, WC1E 7JE, UK
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Abstract

The form of ideal surface chemistry that is necessary for chemically assisted ion beam etching (CAIBE), with particular reference to in-situ processing is considered. Whilst to date CAIBE has been almost exclusively carried out with chlorine, distinct advantages exist if a compound that which displays spontaneous reactivity which is limited to one or two monolayers can be used. The role of alkyl halides in this scenario has been investigated through the use of surface spectroscopic probes to investigate the microscopic chemical and ion beam assisted reactivity that may be achieved. Dichloroethane has been found to display promising behaviour.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 268: Symposium K – Materials Modification by Energetic Atoms and Ions , 1992 , 23
Copyright
Copyright © Materials Research Society 1992

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References

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