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Role of Crystallinity In Roughness of Ru/c Multilayers -An Amorphization Study
Published online by Cambridge University Press: 15 February 2011
Abstract
Single Ru films and Ru/C multilayers were sputtered on silicon substrates, in 2.5 mtorr Ar/O2 atmospheres with oxygen mole fractions from 0 to 5%. Reflectivities of the films were measured near 100eV and at 8048eV (CuKα). Critical angle measurements of the single films showed a loss of optical density consistent with full oxidation in the Ar/5%O2 sputtering atmosphere. Soft x-ray reflectivity of the multilayers was reduced from 24% with no added oxygen to < 1% for Ar/5%O2. Diffraction of CuKα x-rays and plan-view TEM showed that the added oxygen reduced Ru crystal size in all films but did not fully amorphize the Ru layers.
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- Copyright © Materials Research Society 1995
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