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Role of Crystallinity In Roughness of Ru/c Multilayers -An Amorphization Study

Published online by Cambridge University Press:  15 February 2011

C. C. Walton
Affiliation:
Center for X-Ray Optics, Lawrence Berkeley Laboratory, Berkeley, California 94720 Department of Materials Science and Mineral Engineering, University of California, Berkeley California 94720
J. B. Kortright
Affiliation:
Center for X-Ray Optics, Lawrence Berkeley Laboratory, Berkeley, California 94720
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Abstract

Single Ru films and Ru/C multilayers were sputtered on silicon substrates, in 2.5 mtorr Ar/O2 atmospheres with oxygen mole fractions from 0 to 5%. Reflectivities of the films were measured near 100eV and at 8048eV (CuKα). Critical angle measurements of the single films showed a loss of optical density consistent with full oxidation in the Ar/5%O2 sputtering atmosphere. Soft x-ray reflectivity of the multilayers was reduced from 24% with no added oxygen to < 1% for Ar/5%O2. Diffraction of CuKα x-rays and plan-view TEM showed that the added oxygen reduced Ru crystal size in all films but did not fully amorphize the Ru layers.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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