Hostname: page-component-586b7cd67f-rcrh6 Total loading time: 0 Render date: 2024-11-29T07:50:04.753Z Has data issue: false hasContentIssue false

RF Sputter Deposition of Indium Oxide / Indium Iron Oxide Thin Films for Photoelectrochemical Hydrogen Production

Published online by Cambridge University Press:  31 January 2011

William B Ingler
Affiliation:
[email protected], University of Toledo, Physics and Astronomy, 43606, Ohio, United States
Abbasali Naseem
Affiliation:
[email protected], University of Toledo, Physics and Astronomy, 43606, Ohio, United States
Get access

Abstract

This project focuses on using indium oxide and indium iron oxide as an alloy to make a protective thin film (transparent, conductive, and corrosion resistant or TCCR) for amorphous silicon based solar cells, which are used in immersion-type photoelectrochemical cells for hydrogen production. From the work completed, the results indicate that samples made at 250 °C with 30 Watt of indium and 100 Watt of indium iron oxide, and a sputter deposition time of ninety minutes produced optimal results when deposited directly on single junction amorphous silicon solar cells. At 0.65 Volts, the best sample displays a maximum current density of 21.4 mA/cm2.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Ingler, W. B. Jr. and Khan, S. U. M., Thin Sol. Films. 2004. p. 301308.Google Scholar
2 Ingler, W. B. Jr. and Khan, S. U. M., Int. J. Hyd. Ener. 2005. p. 821827.Google Scholar
3 Ingler, W.B. Jr. ; Sporar, D.; Deng, X.Sputter Deposition of In-Fe2O3 Films for Photoelectrochemical Hydrogen ProductionECS Trans. Vol. 3 (State-of-the-Art Program on Compound Semiconductors 45 (SOTAPOCS 45) -and- Wide Bandgap Semiconductor Materials and Devices 7), 2006, 253.Google Scholar
4 Ingler, W. B. Jr ; Ong, G.; Deng, X.RF Sputter Deposition of Indium Oxide – Iron Oxide Films for Photoelectrochemical Hydrogen ProductionECS Trans. Vol. 16, No. 7. (State-ofthe-Art Program on Compound Semiconductors 49 (SOTAPOCS 49), 2008, 49.Google Scholar