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RF and Microwave Plasma Deposition of Polymer Films: Effect of Frequency

Published online by Cambridge University Press:  28 February 2011

R. Claude ,
M. Moisan  and
M. R. Wertheimer
R. Claude
Affiliation:
Département de Physique, Université de Montréal, Montréal H3C 3J7, Québec Département de Génie Physique, Ecole Polytechnique, Montréal H3C 3A7, Québec
M. Moisan
Affiliation:
Département de Physique, Université de Montréal, Montréal H3C 3J7, Québec
M. R. Wertheimer
Affiliation:
Département de Génie Physique, Ecole Polytechnique, Montréal H3C 3A7, Québec
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Abstract

The surface wave (SW) plasma technology is used to investigate possible frequency effects in the deposition kinetics of plasma polymers over the range 100–915 MHz.Hydrocarbon and fluorocarbon monomers are excited by a SW produced argon plasma, at a total pressure of 50 mTorr, under various monomer flows.Using Yasuda's normalization procedure, we have so far been unable to distinguish frequency dependent deposition in this high frequency (HF) regime.However, the present data indicate substantially (an order of magnitude) higher deposition rates than those reported by Gazicki and Yasuda for low frequencies.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 68: Symposium C – Plasma Processing , 1986 , 85
Copyright
Copyright © Materials Research Society 1986

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