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Retention of Ions Implanted at Non-Normal Incidence

Published online by Cambridge University Press:  25 February 2011

K.S. Grabowski ,
N.E.W. Hartley ,
C. R. Gossett  and
I. Manning
K.S. Grabowski
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375,
N.E.W. Hartley
Affiliation:
Georgetown University, Washington, D.C. 20007 (Present address: Aere Harwell, UK)
C. R. Gossett
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375,
I. Manning
Affiliation:
Naval Research Laboratory, Washington, D.C. 20375,
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Abstract

Future applications of ion implantation require a knowledge of how the retention of implanted ions varies with angle of ion incidence. In this work the retention of 150-keV Ar,Ti,Cr,and Ta ions in AISI-M50 and 52100 bearing steels was measured for incidence angles up to 60° off normal. Fluences between 3×1015 and 3×1017/cm2 were used, typically on 3/8” diameter cylindrical samples. Retention was measured for Ar, Ti, and Cr by ion induced x-ray emission and for Ta by backscattering of He ions. Range and sputtering parameters needed for model calculations were experimentally determined from Ta-implanted thin Fe film samples. Generally, at the low-fluence limit a near-cos θ dependence obtained while at the high-fluence limit a (cos θ)8/3 dependence applied where θ is the angle between the sample normal and the beam direction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 615
Copyright
Copyright © Materials Research Society 1984

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References

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