Hostname: page-component-78c5997874-m6dg7 Total loading time: 0 Render date: 2024-11-06T01:22:39.629Z Has data issue: false hasContentIssue false
  • English
  • Français

Resistometric Mapping using a Scanning Tunneling Microscope

Published online by Cambridge University Press:  10 February 2011

C I Lang  and
J Tapson
C I Lang
Affiliation:
Department of Materials Engineering, University of Cape Town, Private Bag, Rondebosch, 7700South Africa, [email protected]
J Tapson
Affiliation:
Department of Electrical Engineering, University of Cape Town, Private Bag, Rondebosch, 7700South Africa, [email protected]
Get access

Abstract

We present a method whereby spatial variations in the resistivity of bulk conductive specimens may be detected on the same scale as the microstructural variations from which they arise. This technique, a new development of scanning tunneling potentiometry, offers significant benefits for microstructural characterization and for investigation of microstructure/resistivity relationships in metallic materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 500: Symposium EE – Electrically Based Microstructural Characterization II , 1997 , 15
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Muralt, P. and Pohl, D.W., Appl. Phys. Lett. 48, 514 (1986).Google Scholar
2. Muralt, P., Meier, H., Pohl, D.W. and Salemink, H.W.M., Appl. Phys. Lett. 50, 1352 (1987).Google Scholar
3. Kirtley, J.R., Washburn, S. and Brady, M.J., Phys. Rev. Lett. 60, 1546 (1988).Google Scholar
4. Schneider, M.A., Wenderoth, M., Heinrich, A.J., Rosentreter, M.A. and Ulbrich, R.G., Appl. Phys. Lett. 69, 1327 (1996).Google Scholar
5. Tapson, J., PhD thesis, UCT (1994).Google Scholar
6. Dovek, M.M., Heben, M.J., Lang, C.A., Lewis, N.S. and Quate, C.F., Rev. Sci. Instrum. 59 2333 (1988).Google Scholar
7. Jacobs, H.O., Knapp, H.F., Muller, S. and Stemmer, A., Ultramicroscopy 69, 39 (1997).Google Scholar
8. Pelz, J.P. and Koch, R.H., Phys. Rev. B 41, 1212 (1990).Google Scholar