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Residual Defects in Virgin and Implanted Si After Laser Processing+
Published online by Cambridge University Press: 15 February 2011
Abstract
EPR, photocarrier cyclotron resonance and DLTS measurements have been performed on laser-annealed Si wafers.
In virgin Si, an isotropic EPR line at g1 = 2.0055± 0.0005 and a carrier lifetime decrease, assessed by cyclotron resonance, are correlated to the creation of vacancy complexes associated to Oxygen.
In implanted Si, only defects due to the tailing effect of implantation process are observed by DLTS. These levels can be divided into two groups, one of them is stronglycorrelated with the implanted parameter. They are ascribed to primary or complex associations of point defects.
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- Copyright © Materials Research Society 1982
Footnotes
Part of this work has been performed under COMES-PIRDES contract.
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