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Published online by Cambridge University Press: 31 January 2011
Si quantum dot (Si-QD) based multi-color metal oxide semiconductor lighting emission diodes (MOSLEDs) made on Si-rich SiOx grown by detuning RF plasma power in a plasma enhanced chemical vapor deposition (PECVD) system are demonstrated. With the RF plasma powers increasing from 50 to 70 W at 10 W increment, the turn-on voltage and maximum electroluminescence (EL) power red-, green- and blue-color MOSLEDs increase from 70, 90 and 99 V and 7, 26 and 55 nW, respectively. The power-current slope of 0.51, 3.24 and 53.82 mW/A are obtained for these MOSLEDs with corresponding power conversion ratio (PCR) of 5.13×10-6, 2.52×10-5 and 2.47×10-4. Both the turn-on voltage and power slope linearly increase with enhancing thickness of the Si-QD based MOSLED.