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Recent Progress in SOI Materials and Devices for VLSI Applications

Published online by Cambridge University Press:  22 February 2011

H. H. Hosack
H. H. Hosack*
Affiliation:
Semiconductor Process and Design Center Texas Instruments, Incorporated Dallas, Texas 75265
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Extract

Silicon-On-Insulator (SOI) technology [1-4] has been shown to have significant performance and fabrication advantages over conventional bulk processing for a wide variety of large scale CMOS IC applications. Advantages in radiation environments has generated significant interest in this technology from military and space science communities [5,6]. Possible advantages of SOI technology for low power, low voltage and high performance circuit applications is under serious consideration by several commercial IC manufacturers [7,8].

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 687
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

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