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Recent Advances in Plasma Deposition of Functional Coatings on Polymers

Published online by Cambridge University Press:  10 February 2011

L. Martinu ,
M. R. Wertheimer  and
J. E. Klemberg-Sapieha
L. Martinu
Affiliation:
Groupe des Couches Minces (GCM), Department of Engineering Physics and Materials Engineering, Ecole Polytechnique, Montreal, Qc, H3C 3A7, Canada.
M. R. Wertheimer
Affiliation:
Groupe des Couches Minces (GCM), Department of Engineering Physics and Materials Engineering, Ecole Polytechnique, Montreal, Qc, H3C 3A7, Canada.
J. E. Klemberg-Sapieha
Affiliation:
Groupe des Couches Minces (GCM), Department of Engineering Physics and Materials Engineering, Ecole Polytechnique, Montreal, Qc, H3C 3A7, Canada.
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Abstract

Plasma enhanced chemical vapor deposition (PECVD) is increasingly being applied for the fabrication of functional coatings on polymeric substrates. This presentation briefly reviews the energetics of plasma-surface interactions leading to the deposition of films for different applications such as optical coatings, barriers against gas and vapor permeation, and protective coatings for space. Particular emphasis is placed on the formation and characterization of a relatively wide (tens of nm) interfacial region (“interphase”) between the coating and the polymer, its role in adhesion, and in optical, mechanical and other functional porperties of thin film systems on plastic substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 544: Symposium Y – Plasma Deposition and Treatment of Polymers , 1998 , 251
Copyright
Copyright © Materials Research Society 1999

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References

1. d'Agostino, R., ed., Plasma Deposition, Treatment and Etching of Polymers,(Academic Press, New York, 1990).Google Scholar
2. d'Agostino, R., Fracassi, F., and Favia, P., eds., Plasma Treatments and Deposition of Polymers,(Kluwer Academic Publishers, Dordrecht, 1997).Google Scholar
3. Kay, E., J. Coburn, and A. Dilks, in Topics in Current Chemistry 94, 1 (1980).Google Scholar
4. Rossnagel, S. M., Cuomo, J. J., and Westwood, W. D., eds., Handbook of Plasma Processing Technology,(Noyes Publications, Park Ridge NJ, 1990).Google Scholar
5. Cuomo, J. J., Rossnagel, S. M., and Kaufmann, H. R., eds., Handbook of Ion Beam Processing Technology,(Noyes Publications, Park Ridge NJ, 1989).Google Scholar
6. Martinu, L., Klemberg-Sapieha, J. E., and Wertheimer, M. R., Appl. Phys. Lett. 54, 2645 (1989).Google Scholar
7. Klemberg-Sapieha, J. E., Küttel, O. M, Martinu, L., and Wertheimer, M. R., Thin Solid Films 193/194, 965 (1990).Google Scholar
8. Martinu, L., Klemberg-Sapieha, J. E., Küttel, O. M., Raveh, A., and Wertheimer, M. R., J. Vac. Sci. Technol. A 12, 1360 (1999).Google Scholar
9. Zabeida, O., Klemberg-Sapieha, J. E., and Martinu, L., Proc. 41’ Ann. Tech. Conf. (Society of Vacuum Coaters, Boston, April 1998), p. 366.Google Scholar
10. Zabeida, O. and Martinu, L., J. Appl. Phys., submitted.Google Scholar
11. Reinke, P., Bureau, S., Klemberg-Sapieha, J. E., and Martinu, L., J. Appl. Phys. 78, 4855 (1996).Google Scholar
12. Klemberg-Sapieha, L. E., Martinu, L., Wertheimer, M. R., Gfinther, P., Schelling, R., Thielemann, C., and Sessler, G., J. Vac. Sci. Techol. A 14, 2775 (1996).Google Scholar
13. Poitras, D., Leroux, P., Klemberg-Sapieha, L. E., Gujrathi, S. C., and Martinu, L., Opt. Eng. 35, 2693 (1996).Google Scholar
14. Klemberg-Sapieha, J. E., Kuittel, O. M., Martinu, L., and Wertheimer, M. R., Proc. 36e Ann. Tech. Meeting,(Society of Vacuum Coaters, Dallas, April 1993), p. 445.Google Scholar
15. Sobrinho, A. S. da Silva, Latrèche, M., Czeremuszkin, G., Klemberg-Sapieha, L. E., and Wertheimer, M. R., J. Vac. Sci. Technol. A 16, 3190 (1998).Google Scholar
16. Zimcik, D. G., Wertheimer, M. R., Balmain, K. G., and Tennyson, R. C., AIAA J. of Spacecraft and Rockets 28, 652 (1991).Google Scholar
17. Wertheimer, M. R., Czeremuszkin, G., Cerny, J., Klemberg-Sapieha, J. E., and Martinu, L., Proc. 7th Int. Symp. on Materials in a Space Environment,(ESA Publication SP-399, Noordwijk, 1997), p.393.Google Scholar
18. Martinu, L., Raveh, A., Domingue, A., Bertrand, L., Klemberg-Sapieha, L. E., Gujrathi, S. C., and Wertheimer, M. R., Thin Solid Films 208, 42 (1992).Google Scholar
19. Raveh, A., Martinu, L., Hawthorne, H. M., and Wertheimer, M. R., Surf. Coat. Technol. 58, 45 (1993).Google Scholar
20. Zabeida, O., Klemberg-Sapieha, L. E., Martinu, L., and Morton, D., this volume.Google Scholar
21. Klemberg-Sapieha, I. E., Martinu, L., Küttel, O. M., and Wertheimer, M. R., in Metallized Plastics II,Susko, J. R. and Mittal, K. L., eds., (Plenum, New York, 1992), p.315.Google Scholar
22. Liston, E. M., Martinu, L., and Wertheimer, M. R., J. Adhes. Sci. Technol. 7, 1091 (1993).Google Scholar
23. Holländer, A. and Wertheimer, M. R., J.Vac. Sci. Technol. A 12, 879 (1994).Google Scholar
24. Holländer, A., Klemberg-Sapieha, J. E., and Wertheimer, M. R., J. Polym. Sci.-A: Polym. Chem. 33, 2013 (1995); 34, 1511 (1996).Google Scholar
25. Fozza, A. C., Roch, J., Klemberg-Sapieha, J. E., Kruse, A., Hollander, A., and Wertheimer, M. R., Nucl. Instrum. and Meth. B 131, 205 (1997).Google Scholar
26. Fozza, A. C., Bergeron, A., Klemberg-Sapieha, J. E., and Wertheimer, M. R., this volume.Google Scholar
27. Bergeron, A., Klemberg-Sapieha, J. E., and Martinu, L., J. Vac. Sci. Technol. A, 16, 3227 (1998).Google Scholar
28. Gerenser, L., J. Vac. Sc. Technol. A 6, 2897 (1988).Google Scholar
29. Martinu, L., in ref.2.Google Scholar
30. Klemberg-Sapieha, J. E., Poitras, D., Martinu, L., Yamasaki, N. L. S., and Lantman, C. W., J. Vac. Sci. Technol. A 15, 985 (1997).Google Scholar
31. Sobrinho, A. S. da Silva, Schfihler, N., Klemberg-Sapieha, J. E., Wertheimer, M. R., Andrews, M., and Gujrathi, S. C., J. Vac. Sci. Technol. A 16, 2021 (1998).Google Scholar
32. Klemberg-Sapieha, J. E., in ref. 2Google Scholar
33. Klemberg-Sapieha, J. E., unpublished results.Google Scholar