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Real-Time Monitoring of Hydrogen Elimination Processes in Pulsed-Gas PECVD Using in Situ Mass Spectroscopy

Published online by Cambridge University Press:  15 February 2011

Easwar Srinivasan ,
Jeremy S. Bordeaux  and
Gregory N. Parsons
Easwar Srinivasan
Affiliation:
Dept. of Chemical Engineering, North Carolina State University, Raleigh, NC 27695.
Jeremy S. Bordeaux
Affiliation:
Dept. of Chemical Engineering, North Carolina State University, Raleigh, NC 27695.
Gregory N. Parsons
Affiliation:
Dept. of Chemical Engineering, North Carolina State University, Raleigh, NC 27695.
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Abstract

In situ mass spectroscopy is used to monitor and analyze the hydrogen elimination reaction products during cyclical exposure of thin films of amorphous silicon to a flux of atomic deuterium. Mass spectroscopy results that atomic deuterium etches deposited silicon forming SiD4 and abstracts hydrogen bonded to silicon in the film to form HD. The relative signal intensities show that abstraction is the primary hydrogen elimination mechanism. The energy of activation for the abstraction reaction is obtained from the mass spectroscopy signals through a first order kinetic analysis and is found to be approximately zero, indicating that abstraction is not thermally activated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 452 , 1996 , 755
Copyright
Copyright © Materials Research Society 1997

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References

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