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Rapid Annealing of GaAs: Uniformity and Temperature Dependence of Activation

Published online by Cambridge University Press:  26 February 2011

K. D. Cummings ,
S. J. Pearton  and
G. P. Vella-Coleiro
K. D. Cummings
Affiliation:
AT&T Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974
S. J. Pearton
Affiliation:
AT&T Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974
G. P. Vella-Coleiro
Affiliation:
AT&T Bell Laboratories, 600 Mountain Avenue, Murray Hill, NJ 07974
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Abstract

Scanning microwave photoconductance, capacitance-voltage profiling and Hall effect measurements were used to investigate the uniformity of activation of Si, Be and Mg implanted 2″ and 3″ diameter, semi-insulating GaAs substrates after rapid thermal annealing in a commercial furnace. The results indicate that carrier lifetimes and mobilities for low dose (3−4 × 1012 cm−2) implants and carrier densities for high dose (1× 1015 cm−2) implants are comparable or superior in rapidly annealed substrates to those obtained in thermally annealed implanted layers. The uniformity of these parameters is not significantly different for wafers annealed by either method. The temperature dependence of damage removal and carrier activation in the implanted regions during both furnace and transient annealing was also investigated, and demonstrates that the microwave photoconductance technique gives results for donor implantation correlating well with conventional backscattering and electrical measurements respectively.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 52: Symposium B – Rapid Thermal Processing , 1985 , 375
Copyright
Copyright © Materials Research Society 1986

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