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Raman Spectroscopic Evaluation of Silicides Formed with A Scanned Electron Beam

Published online by Cambridge University Press:  15 February 2011

R. J. Nemanich ,
T. W. Sigmon ,
N. M. Johnson ,
M. D. Moyer  and
S. S. Lau
R. J. Nemanich
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, California, 94304
T. W. Sigmon
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, California, 94304 Standard Electronics Laboratories, Standard, California, 94305
N. M. Johnson
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, California, 94304
M. D. Moyer
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, California, 94304
S. S. Lau
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, California, 94304 University of California, San Diego, La Jolla, California, 92093
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Abstract

Raman scattering and Rutherford backscattering are used to study the products of SEM processing of Pd and Pt thin films on Si(100) substrates. The RBS measurements indicate the compositional depth profile of the resulting silicide while the Raman scattering indicates the crystal structure. For both cases it is found that the resultant silicide is dominated by Pd2 Si (or Pt2Si) structures but evidence of deviations are also noted.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1: Symposium – Laser and Electron-Beam Solid Interactions in Materials Processing , 1980 , 541
Copyright
Copyright © Materials Research Society 1981

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References

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