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Radiation Effects in Radwaste Glasses : A Reappraisal of Alpha-Recoil Aging as Simulated by Ion Implantation.

Published online by Cambridge University Press:  15 February 2011

J.C. Dran
Affiliation:
Laboratoire René Bernas, B.P. 1, 91406 Orsay, France.
Y. Langevin
Affiliation:
Laboratoire René Bernas, B.P. 1, 91406 Orsay, France.
M. Maurette
Affiliation:
Laboratoire René Bernas, B.P. 1, 91406 Orsay, France.
J.C. Petit
Affiliation:
Laboratoire René Bernas, B.P. 1, 91406 Orsay, France.
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Abstract

New results on the etchability of lead implanted silicate glasses are presented which are satisfactorily accounted for by a Monte Carlo Model of etching. These results strongly support the radiation damage origin of the ion-induced modification of the chemical reactivity of glass. Major artefacts of ion implantation are then discarded as possible causes of the observed effects and consequently this technique is shown to be a valuable tool for the study of α-recoil aging in H.L.W. glasses.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

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