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Pyrometric Emissivity Measurements and Compensation in an RTP Chamber

Published online by Cambridge University Press:  25 February 2011

J. Nulman ,
B. Cohen ,
W. Blonigan ,
S. Antonio ,
R. Meinecke  and
A. Gat
W. Blonigan
Affiliation:
AG Associates, 1325 Borregas Ave., Sunnyvale, CA 94089
S. Antonio
Affiliation:
AG Associates, 1325 Borregas Ave., Sunnyvale, CA 94089
R. Meinecke
Affiliation:
AG Associates, 1325 Borregas Ave., Sunnyvale, CA 94089
A. Gat
Affiliation:
AG Associates, 1325 Borregas Ave., Sunnyvale, CA 94089
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Abstract

The emissivity effects and compensation schemes encountered in pyrometric temperature measurements in RTP systems are described in this paper. The emissivity effects include substrate roughness, layered films, substrate temperature, and chamber reflectivity. Compensation techniques are derived based on the emissivity effects, and include reference thermocouples and reflectance-based measurements. Compensated emissivity results in wafer-to-wafer temperature variations of less than ± 6 C, compared to as much as ± 100 C for uncompensated emissivity. A new model for emissivity analysis at temperatures larger than 700 C is also described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 146: Symposium B – Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing , 1989 , 461
Copyright
Copyright © Materials Research Society 1989

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References

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