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Pulsed Laser Deposition of Epitaxial Sr(RuxSn1-x)O3 Thin Film Electrodes and KNbO3/Sr(RuxSnl-x)O3 Bilayers

Published online by Cambridge University Press:  15 February 2011

H.-M. Christen ,
L. A. Boatner ,
L. Q. Englisht ,
L. A. Géa ,
P. J. Marrero  and
D. P. Norton
H.-M. Christen
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
L. A. Boatner
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
L. Q. Englisht
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
L. A. Géa
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
P. J. Marrero
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
D. P. Norton
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
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Abstract

Sr(RuxSnl-x)O3 is proposed as a new conducting oxide for use in epitaxial multilayer structures. The Sr(Ru0.48Sn0.52)O3 composition exhibits an excellent lattice match with (100)-oriented KTaO3, and films of this composition grown by pulsed laser deposition on KTaO3, SrTiO3, and LaAIO3 substrates have been analyzed by X-ray diffraction, Rutherford backscattering/ion channeling, and resistivity measurements. Epitaxial KNbO3/Sr(Ru0 48Sn0.52)O3 bilayers have been successfully grown.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 401: Symposium G – Epitaxial Oxide Thin Films II , 1995 , 203
Copyright
Copyright © Materials Research Society 1996

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References

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