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Pulsed Laser Deposition of Chromium Oxides: Substrate Effects

Published online by Cambridge University Press:  21 March 2011

Helia Jalili ,
Nina Heinig  and
K. T. Leung
Helia Jalili
Affiliation:
Departments of Physics and Chemistry, University of Waterloo, Waterloo, N2L 3G1, Canada
Nina Heinig
Affiliation:
Departments of Physics and Chemistry, University of Waterloo, Waterloo, N2L 3G1, Canada
K. T. Leung
Affiliation:
Departments of Physics and Chemistry, University of Waterloo, Waterloo, N2L 3G1, Canada
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Abstract

Pulsed Laser Deposition (PLD) was used to grow chromium oxides (CrOx) on MgO(100), Al2O3(0001), SrTiO3(100), LaAlO3(100), and Si(100) under different growth conditions, including substrate temperature, O2 pressure, and laser fluence. SEM, AFM and XRD measurements show that various phases of CrOx films with different morphologies could be obtained on different substrates under the same growth conditions. Half-metallic CrO2 needle-like nanostructured films were only observed on MgO(100) under a special set of conditions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 998: Symposium J – Nanoscale Magnetics and Device Applications , 2007 , 998-J05-06
Copyright
Copyright © Materials Research Society 2007

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References

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