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Pulsed Lasek Atom Probe Analysis of Stoichiometry Variations in GaAlAs

Published online by Cambridge University Press:  26 February 2011

C.R.M. Grovenor ,
A. Cerezo  and
G.D.W. Smith
C.R.M. Grovenor
Affiliation:
Department of Metallurgy and Science of Materials, Parks Road, OXFORD, UK.
A. Cerezo
Affiliation:
Department of Metallurgy and Science of Materials, Parks Road, OXFORD, UK.
G.D.W. Smith
Affiliation:
Department of Metallurgy and Science of Materials, Parks Road, OXFORD, UK.
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Abstract

The recent development of Pulsed Laser Atom Probe (PLAP) analysis has allowed routine analysis of the composition of a wide range of semiconducting materials. This paper presents results on the analysis of stoi chiometry variations in MOCVü GaAlAs layers demonstrating that accurate analysis of aluminium concentration fluctuations can be achieved with this technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 54: Symposium E – Thin Films–Interfaces and Phenomena , 1985 , 633
Copyright
Copyright © Materials Research Society 1986

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References

REFERENCES

[1]. Muller, E.W, Panitz, J.A. and McLane, S.B.. Rev. Sci. Instrum. 39 83 1968.Google Scholar
[2]. Kellogg, G.L. and Tsong, T.T.. J. Appl. Phys. 51 1184 1980.Google Scholar
[3]. Cerezo, A., Grovenor, C.R.M. and D.W.|Smith, G.. J. Microscopy To be published.Google Scholar
[4]. Ohno, Y., Kuroda, T. and Nakamura, S.. Surf. Sci. 75 689 1978.Google Scholar
[5]. Tsong, T.T., Ng, Y.S. and Melmed, A.J.. Surf. Sci. 77 L187 1978.Google Scholar
[6]. Yamamoto, M., Seidman, D.N. and Nakamura, S.. Surf. Sci. 118 555 1982.Google Scholar
[7]. Nishikawa, O., Namura, E., Kawada, H. and Oida, K.. Proc. 32nd Int. Field Emission Symp. Wheeling, West Virginia July 1985. To be published in J. dePhysique 1985.Google Scholar
[8]. Cerezo, A., Grovenor, C.R.M. and Smith, G.D.W.. Appl. Phys. Lett. 46 567 1985 Google Scholar
[9]. Grovenor, C.R.M., Cerezo, A. and Smith, G.D.W., in Microscopy of Semiconducting Materials 1985, (Edited by Cullis, A.G. and Holt, U.B. (Hilger, Bristol, 1985) pp.423–428.Google Scholar
[10]. Treacy, M.M.J., Gibson, J.M. and Howie, A.. Phil. Mag. A51 389 1985.Google Scholar
[11]. Henoc, P., Lzrael, A., Quillec, M. and Launois, H.. Appl. Phys. Lett. 40 963 1982.Google Scholar