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Properties of ZnO Thin Films Deposited by Spray Pyrolysis and Magnetron Sputtering

Published online by Cambridge University Press:  17 March 2011

Patrícia Nunes ,
Elvira Fortunato  and
Rodrigo Martins
Patrícia Nunes
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Elvira Fortunato
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Rodrigo Martins
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
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Abstract

In this work we present a study of the properties of ZnO thin films produced by spray pyrolysis and r.f. magnetron sputtering. Before the annealing treatment the properties of the films are very similar, which means that the films produced by both techniques could be used on optoelectronic devices. However spray pyrolysis is a more simple and cheap technique than sputtering, but with this last technique the thin films exhibit a higher uniformity.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 685: Symposium D – Advanced Materials and Devices for Large-Area Electronics , 2001 , D5.8.1
Copyright
Copyright © Materials Research Society 2001

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