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Properties Of SiC Film As X-Ray Mask Membrane

Published online by Cambridge University Press:  15 February 2011

Yoh-Ichi Yamaguchi ,
Norimichi Annaka ,
Tsutomu Shoki ,
Isao Amemiya ,
Hiroyuki Nagasawa ,
Hiroyuki Kosuga  and
Osamu Nagarekawa
Yoh-Ichi Yamaguchi
Affiliation:
Materials Research Laboratory, HOYA Corporation, Akishima-shi, Tokyo, Japan
Norimichi Annaka
Affiliation:
Electronics Division, HOYA Corporation, Nagasaka-cho, Yamanashi, Japan
Tsutomu Shoki
Affiliation:
Materials Research Laboratory, HOYA Corporation, Akishima-shi, Tokyo, Japan
Isao Amemiya
Affiliation:
Electronics Division, HOYA Corporation, Nagasaka-cho, Yamanashi, Japan
Hiroyuki Nagasawa
Affiliation:
Materials Research Laboratory, HOYA Corporation, Akishima-shi, Tokyo, Japan
Hiroyuki Kosuga
Affiliation:
Materials Research Laboratory, HOYA Corporation, Akishima-shi, Tokyo, Japan
Osamu Nagarekawa
Affiliation:
Electronics Division, HOYA Corporation, Nagasaka-cho, Yamanashi, Japan
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Abstract

Many properties of LPCVD SiC film as X-ray mask membrane have been investigated in detail. The film has an atomic ratio of 1.0 and negligible impurities, and was found to be damage-free to SR X-rays up to 500 KJ/cm2. An integrated transparency of 1.05 μm thick SiC membrane for SR X-rays was measured to be 76%. The interference peak at 633 nm of optical spectrum has given the membrane of around 1.0 μm in thickness the transmittance peak of 70% and increased to more than 80% after an AR coating or planarizations by polishing and etching-back. The attainable transmittance was found to be limited to about 84%, theoretically and experimentally, due to the absorption of the membrane. The peak transmittance of 87% is obtainable by the AR coating on the polished SiC membrane. The internal stress was found to be independent of thicknesses above 0.6 μm and the measured Young's modulus is 4.5×1011 Pa irrespective of the thickness and stress. Some extremely polished (0.1 nm Ra) and all the etched-back membranes studied withstood breakage at the pressure as high as the as-deposited ones. The stress uniformity in 30 mm square of the membrane was found to be ± 10 % by measuring five local stresses with a bulge method.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 306: Symposium K – Materials Aspects of X-Ray Lithography , 1993 , 197
Copyright
Copyright © Materials Research Society 1993

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