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Properties of amorphous silicon-germanium films and devices deposited at higher growth rates

Published online by Cambridge University Press:  01 February 2011

Yong Liu  and
Vikram L. Dalal
Yong Liu
Affiliation:
Dept. of Electrical and Computer Engr. and Microelectronics Research Center, Iowa State University, Ames, Iowa 50011
Vikram L. Dalal
Affiliation:
Dept. of Electrical and Computer Engr. and Microelectronics Research Center, Iowa State University, Ames, Iowa 50011
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Abstract

We report on the growth and properties of amorphous Silicon-Germanium [a–(Si,Ge):H] films and devices fabricated at growth rates of ∼ 5 Å/sec using a remote ECR plasma growth process. The films and devices were made using mixtures of germane and silane along with dilution with hydrogen and helium. The addition of He to the gas mixture significantly increased the growth rates. It was found that hydrogen was always necessary in order to achieve the best film and device properties. Films and devices were made across the entire bandgap range, from a-Si to a-Ge. High ratios of photo/dark conductivity and low values of Urbach energy ( > 50 meV) indicate good film properties. The defect densities were measured using space charge limited current techniques. The defect densities were in the range of 1-2 x 10 16/cm 3 –eV, about 5 times higher than for a-Si:H. Electron mobility-lifetime products were measured and found to be in the range of 2-4 x 10-7 cm2/V, even for low gap materials (1.35 eV). Single and graded gap devices were fabricated in these materials. Device fill factors of ∼ 70% were obtained in graded gap devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 715: Symposium A – Amorphous and Heterogeneous Silicon-Based Films-2002 , 2002 , A18.3
Copyright
Copyright © Materials Research Society 2002

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