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Production of Diamond-Like Carbon Films by Plasma Source Ion Implantation

Published online by Cambridge University Press:  25 February 2011

Ling Xie ,
Frank J. Worzala ,
John R. Conrad  and
Richard A. Dodd
Ling Xie
Affiliation:
Engineering Research Center for Plasma-Aided Manufacturing, 1500 Johnson Drive, University of Wisconsin-Madison, Madison, WI 53706
Frank J. Worzala
Affiliation:
Engineering Research Center for Plasma-Aided Manufacturing, 1500 Johnson Drive, University of Wisconsin-Madison, Madison, WI 53706
John R. Conrad
Affiliation:
Engineering Research Center for Plasma-Aided Manufacturing, 1500 Johnson Drive, University of Wisconsin-Madison, Madison, WI 53706
Richard A. Dodd
Affiliation:
Engineering Research Center for Plasma-Aided Manufacturing, 1500 Johnson Drive, University of Wisconsin-Madison, Madison, WI 53706
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Abstract

In addition to being successfully used for ion implantation, the plasma source ion implantation (PSII) technique has been used to produce diamond-like carbon films. Homogeneous, adherent films were obtained on silicon and stainless steel substrates under 2 kV pulse bias voltages and 50 mtorr methane plasma pressure. Chemical composition analysis was made using Auger electron microscopy. Fretting wear tests and scratch tests were performed to study the tribological and adherent properties. Cross sectional TEM samples were prepared. The interfacial microstrucutres and chemical compositions were analyzed using transmission electron microscopy and scanning transmission electron microscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 270: Symposium M – Novel Forms of Carbon , 1992 , 499
Copyright
Copyright © Materials Research Society 1992

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References

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