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Process Modeling for Advanced Devices

Published online by Cambridge University Press:  17 March 2011

Mark E. Law ,
Kevin S. Jones ,
Ljubo Radic ,
Robert Crosby ,
Mark Clark ,
Kevin Gable  and
Carrie Ross
Mark E. Law
Affiliation:
Department of Electrical and Computer EngineeringUniversity of Florida, Gainesville, FL 32608, USA
Kevin S. Jones
Affiliation:
Department of Materials Science and EngineeringUniversity of Florida, Gainesville, FL 32608, USA
Ljubo Radic
Affiliation:
Department of Electrical and Computer EngineeringUniversity of Florida, Gainesville, FL 32608, USA
Robert Crosby
Affiliation:
Department of Materials Science and EngineeringUniversity of Florida, Gainesville, FL 32608, USA
Mark Clark
Affiliation:
Department of Materials Science and EngineeringUniversity of Florida, Gainesville, FL 32608, USA
Kevin Gable
Affiliation:
Department of Materials Science and EngineeringUniversity of Florida, Gainesville, FL 32608, USA
Carrie Ross
Affiliation:
Department of Materials Science and EngineeringUniversity of Florida, Gainesville, FL 32608, USA
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Extract

As device lots become more and more expensive, process modeling is increasingly important. Process simulation and modeling is increasingly sophisticated but the accuracy remains a problem. There is generally a time lag between the introduction of a particular process and its accurate modeling – the problem of “yesterday's technology modeled tomorrow”. For many problems, absolute accuracy isn't required. Relative trends provide excellent information about the process in question. For this reason, process simulation is still a useful technique for guiding process development.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 810: Symposium C – Silicon Front-End Junction Formation-Physics and Technology , 2004 , C3.1
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

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