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Process Control for a Rapid Optical Annealing System

Published online by Cambridge University Press:  26 February 2011

Jeffrey C. Gelpey ,
Paul O. Stump  and
John W. Smith
Jeffrey C. Gelpey
Affiliation:
Eaton Corporation, Ion Beam Systems Division, Beverly, MA 01915
Paul O. Stump
Affiliation:
Eaton Corporation, Ion Beam Systems Division, Beverly, MA 01915
John W. Smith
Affiliation:
Eaton Corporation, Ion Beam Systems Division, Beverly, MA 01915
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Abstract

When high temperature processes are being carried out in a diffusion furnace, temperature control is accomplished in a straight forward manner. By using thermocouples and a proportional controller, sufficient accuracy and control are available to the process engineer.

But with the current shift toward the more rapid annealing schemes, better control is a necessity. In order to achieve this accuracy, especially when the heat source is a 100 kilowatt arc lamp, more sophisticated control methods must be employed. By using an optical pyrometer tuned to operate at a wavelength where external interferences are minimized, wafer temperature may be monitored to a high degree of accuracy and with the fast response times needed.

Coupling the output of the pyrometer to a microprocessor based controller allows the engineer to create and use multi stepped time/temperature profiles which are highly repeatable.

This paper will describe such a system and how it is used in a production oriented rapid optical annealing system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 52: Symposium B – Rapid Thermal Processing , 1985 , 199
Copyright
Copyright © Materials Research Society 1986

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References

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