Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-25T17:41:06.900Z Has data issue: false hasContentIssue false

Probing Surface Roughness and Porosity through Adsorption of Wetting Layers

Published online by Cambridge University Press:  15 February 2011

J. Krim
Affiliation:
Department of Physics, Northeastern University, Boston, MA 02115
V. Panella
Affiliation:
Department of Physics, Northeastern University, Boston, MA 02115
Get access

Abstract

We have employed a quartz microbalance technique to record adsorption isotherms on silver and gold surfaces whose roughness has also been characterized by x-ray reflectivity or scanning tunneling microscopy. We observe strikingly different behavior for two different liquid adsorbates (oxygen and nitrogen), and attribute this to a difference in their surface tension. Our results demonstrate the impact that capillary condensation phenomena can have on the interpretation of adsorption data, particularly with regards to the fractal nature of the substrate. Valuable information on surface morphology can nonetheless be obtained from adsorption isotherms, if combined with alternate experimental techniques.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Mandelbrot, B. B., The Fractal Geometry of Nature (Freeman, New York, 1982)Google Scholar
2. Chiarello, R., Panella, V., Krim, J. and Thompson, C., Phys. Rev. Lett. 67, 3408 (1991)Google Scholar
3. Sikkenk, J. H., van Leeuwen, J. M. J., Vossnack, E. O., and Bakker, A. F., Physica 146A, 622 (1987)Google Scholar
4. Mitchell, M. W. and Bonnell, D. A., J. Mater. Res. 5, 2244 (1990); E. A. Eklund et al., Phys. Rev. Lett. 67, 1759 (1991); J. Krim et al. Phys. Rev. Lett. 70, 57 (1993); D. A. Kessler et al. Phys. Rev. Lett. 69, 100 (1992); M. A. Rubio etal. Phys. Rev. Lett. 63, 1685 (1989); V. K. Horvath et al. J. Phys. A 24, L25 (1991)Google Scholar
5. For a review, see Family, F. and Vicsek, T., Dynamics of Fractal Surfaces (World Scientific, Singapore, 1991)Google Scholar
6. Krim, J. and Indekeu, J. O., Phys. Rev. E 48, 1579 (1993)Google Scholar
7. Family, F. and Vicsek, T. J. Phys. A 18, L75 (1985)Google Scholar
8. Drake, J.M., Yacullo, L.N., Levitz, P. and Klafter, J., J.Chem Phys. 98, 380 (1994)Google Scholar
9. Pfeifer, P., Wu, Y. J., Cole, M. W. and Krim, J. Phys. Rev. Lett. 62, 1997 (1989)Google Scholar
10. de Gennes, P. G., in Physics of Disordered Materials, edited by Adler, D., Fritzsche, H., and Ovshinsky, S. R. (Plenum, New York, 1985).Google Scholar
11. Frenkel, J., Kinetic Theory of Liquids, (Oxford University Press, London, 1949); G. D. Halsey, J. Chem. Phys. 17, 520 (1949); T. C. Hill, J. Chem. Phys. 17, 590 (1949)Google Scholar
12. Cheng, E. and Cole, M. W., Phys. Rev. B 38, 987 (1988)Google Scholar
13. Kardar, M. and Indekeu, J. O., Europhys. Lett. 12, 161 (1990); Phys. Rev. Lett. 65, 663 (1990).Google Scholar
14. Pfeifer, P., Kenntner, J., and Cole, M. W., in Fundamentals of Adsorption, edited by Mersmann, A. B. and Sholl, S. E. (Engineering Foundation, New York, 1991), p. 689.Google Scholar
15. Neimark, A. V., Pis'ma Zh. Eksp. Teor. Fiz. 51, 535 (1990) [ JETP Lett. 51, 608 (1990)]Google Scholar
16. Avnir, D. and Jaroniec, M., Langmuir 5,1431 (1989); M. Jaroniec, X. Lu, R. Madey and D. Avnir, J. Chem. Phys. 92, 7589 (1990)Google Scholar
17. Robbins, M. O., Andelman, D., and Joanny, J. F., Phys. Rev. A 43, 4344 (1991)Google Scholar
18. Neimark, A.V., Phys. Rev. B, in pressGoogle Scholar
19. Sycon Instruments, Inc., East Syracuse, NY, (315)463–5297; 6 MHz quartz crystal unit for deposition rate monitors.Google Scholar
20. Palasantzas, G. and Krim, J., Phys. Rev. Lett., in pressGoogle Scholar
21. Thompson, C., Palasantzas, G., Feng, Y.P., Sinha, S.K. and Krim, J., Phys. Rev. B 49, 4902 (1994)Google Scholar
22. Panella, V. and Krim, J., Phys. Rev. E 49, 4179 (1994)Google Scholar
23. Mak, C. and Krim, J., unpublishedGoogle Scholar
24. Rauber, S., Klein, J. R., Cole, M. W., and Bruch, L. W., Surf. Sci. 123,173 (1982)Google Scholar
25. Baly, E. C. C. and Donnan, F. G., J. of Chem. Soc. of London 81, 907 (1902)Google Scholar
26. Stogryn, D. E. and Stogryn, A. P., Mol. Phys. 11, 371 (1966)Google Scholar
27. Krim, J., Heyvaert, I., Van Haesendonck, C. and Bruynseraede, Y., Phys. Rev. Lett 70, 57 (1993)Google Scholar