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Preparation of Oriented GaAs Bicrystal Layers by Vapor-Phase Epitaxy Using Lateral Overgrowth
Published online by Cambridge University Press: 15 February 2011
Abstract
This paper describes a novel technique that utilizes vapor-phase epitaxy to grow bicrystal semiconductor layers with predetermined rotation axis, misorientation angle, and grain boundary plane. The geometrical structure of the grain boundary in each layer is therefore completely specified. The technique has been demonstrated by using the AsCl3-GaAs-H2 method to grow a series of GaAs bicrystals, each containing a [110] tilt boundary formed by a grain with a (111)B boundary plane and a grain rotated from (111)B by a selected misorientation angle. The results of initial electrical measurements indicate that the height of the potential barrier associated with each grain boundary varies with the misorientation angle.
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- Copyright © Materials Research Society 1982